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Tin-doped Indium oxide thin films in different compositions (Sn = 0,5,10,15,20 at.wt%) were prepared on glass substrates at the substrate temperature of 250 °C in an oxygen atmosphere by electron beam evaporation. The structural and morphological studies were carried out by X-ray diffraction (XRD) and scanning electron microscopy (SEM). The grain size of the ITO films decreased when increasing the...
Nitrogen-doped titanium dioxide thin films with visible light photoresponse were prepared by oxidation of sputtered TiN x films, whose nitrogen contents can be easily changed by controlling the volume ratio of N 2 /(Ar+N 2 ) during reactive direct current (DC) magnetron sputtering process. The reference TiO 2 sample was also deposited by the same method under Ar/O ...
High-quality CuCrO 2 films were prepared by pulsed laser deposition (PLD). The film deposited with the pulse energy density (PED) of 2 mJ/cm 2 is highly c-axis oriented. The refractive index of the CuCrO 2 films is about 1.29 obtained by transmission spectra of the films, which implies that the CuCrO 2 film will be a potential antireflection coating in visible light...
AISI D2 is the most commonly used cold-work tool steel of its grade. It offers high hardenability, low distortion after quenching, high resistance to softening and good wear resistance. The use of appropriate hard coatings on this steel can further improve its wear resistance. Boronizing is a surface treatment of Boron diffusion into the substrate. In this work boride layers were formed on AISI D2...
For measuring the current–voltage (I–V) characteristic curve with respect to flowing plasmas, a Langmuir probe, a conducting object, should be inserted to the region directly, and the interaction between the probe and the flowing plasma is not avoidable. This interaction can cause the serious problem for plasma diagnostics due to aerodynamic and thermal disturbances generated by inserting the metallic...
Transparent conducting zirconium-doped zinc oxide (ZnO:Zr) films were deposited on quartz substrates by direct current (DC) magnetron sputtering at room temperature. The influence of post-annealing temperature on the structural, morphological, electrical and optical properties of ZnO:Zr films were investigated. When annealing temperature increases from room temperature to 573 K, the resistivity decreases...
Electrical conductivity in the dark, σ, and thermoelectric power, S, of Pb x Sn 1−x Te 0.5 Se 0.5 films with x = 0.4, 0.6, 0.8, and 1 were studied for films annealed at 473 K in the temperature range 300–473 K, while the Hall voltage was investigated at room temperature. The temperature dependence of σ revealed an intrinsic conduction mechanism above 370 K, while for...
Ti films of different thickness ranging from 12.3 to 246.2nm were deposited, using resistive heat method and post-annealed at different temperatures with a flow of 5cm 3 s −1 oxygen. The nano-structures of the films were obtained using X-ray diffraction (XRD) and atomic force microscopy (AFM). The results showed an initial reduction of the grain size at 373K annealing temperature and...
TiN-containing amorphous Ti–Si–N (nc-TiN/a-Si 3 N 4 ) nanocomposite coatings were deposited by using a modified closed field unbalanced middle frequency magnetron sputtering system which is arc assisted and consists of two circles of targets, at a substrate temperature of 400°C. The coatings exhibit good mechanical properties that are greatly influenced by the total gas pressure and...
TiN–MoS x composite coatings were deposited by pulsed DC closed-field unbalanced magnetron sputtering (CFUBMS) using separate Ti and MoS 2 targets in an Ar and N 2 gas environment. The effect of substrate bias voltage on the structure and mechanical properties of TiN–MoS x composite coating has been studied. The structure and composition of the coating were evaluated...
A large area inductively coupled plasma source with an internal linear-type antenna was operated in dual frequency mode (2 MHz/13.56 MHz), and the electrical/plasma characteristics of the ICP source were examined as a function of the relative rf power ratio. When the source was operated in single frequency mode (13.56 MHz only), approximately 8.5% plasma uniformity was observed at 5 kW of 13.56 MHz...
This paper studies the glow intensity distribution of the discharge plasma against the tube radius and reports the radial profiles of electron temperature and plasma concentration in the rf capacitive discharge registered with a Langmuir probe. An abrupt increase of electron temperature and glow intensity near the tube wall in the weak-current α-mode of the rf capacitive discharge is revealed, the...
Optical properties of fluorine doped diamond-like carbon (F:DLC) films deposited by the direct current plasma enhanced chemical vapor deposition (PECVD) technique were studied in detail. Surface morphologies of the F:DLC films were studied by an atomic force microscope, which indicated surface roughness increased with increase in at.% of F in the films. The chemical binding was investigated by X-ray...
According to the analysis to the characteristics of welding heat source and thermal effect, a mathematic model of rotary Gaussian body heat source with incremental power-density-distribution was developed, which was in line with the characteristics of heat source during vacuum electron beam welding. The affecting radius of source model decreases progressively with the law of Gaussian function and...
The current–voltage and capacitance–voltage characteristics of Au/n-Si/Al Schottky barrier diode were measured in the temperature range of 100–800°C. Au/n-Si/Al Schottky barrier diode annealed at temperatures from 100°C to 400°C for 5min and from 500°C to 800°C for 7min in N 2 atmosphere. The electronic parameters such as barrier height and ideality factor (n) of the device were determined...
Layer-pair number ranged from 9 to 22 of 355nm LaF 3 /MgF 2 high reflectors were deposited by boat resistant heating onto substrates of fused silica and K9 glasses, and the total stress was obtained by curvature measurements. The stress increased with incremental layers until crazing happed because of huge tensile stress at higher layer-pair number. Two methods called post-heat treatment...
Cyclic plasma oxynitriding and cyclic plasma nitriding catalyzed by rare earth La of AISI 420 martensitic stainless steel were performed and compared with conventional plasma nitriding. The nitrided layers were investigated by means of an optical microscope, microhardness tester, Auger electron spectroscopy (AES), X-ray diffraction (XRD), wear machine, scanning electron microscope (SEM) and energy...
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