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Tin-doped Indium oxide thin films in different compositions (Sn = 0,5,10,15,20 at.wt%) were prepared on glass substrates at the substrate temperature of 250 °C in an oxygen atmosphere by electron beam evaporation. The structural and morphological studies were carried out by X-ray diffraction (XRD) and scanning electron microscopy (SEM). The grain size of the ITO films decreased when increasing the...
Ti films of different thickness ranging from 12.3 to 246.2nm were deposited, using resistive heat method and post-annealed at different temperatures with a flow of 5cm 3 s −1 oxygen. The nano-structures of the films were obtained using X-ray diffraction (XRD) and atomic force microscopy (AFM). The results showed an initial reduction of the grain size at 373K annealing temperature and...
We report crack-free and single-crystalline wurtzite GaN heteroepitaxy layers have been grown on Si (111) substrate by metal-organic chemical vapor deposition(MOCVD). Synthesized GaN epilayer was characterized by X-ray diffraction(XRD), atomic force microscope (AFM) and Raman spectrum. The test results show that the GaN crystal reveals a wurtzite structure with the <0001> crystal orientation...
Nanocrystalline zinc oxide thin films were deposited on glass and silicon substrates by using pulsed laser deposition at different laser energy densities (1.5, 2, and 3J/cm 2 ). The film thickness, surface roughness, composition, optical and structural properties of the deposited films were studied using an α-step surface profilometer, atomic force microscopy (AFM), X-ray photoelectron spectroscopy...
X-ray diffraction (XRD) studies of ZnS thin films grown on GaAs (001) substrates at different temperatures by rf magnetron sputtering have been carried out using CuKα radiation. XRD analysis reveals that deposited films below 335°C, assumed the zinc blend structure. Samples annealed at above 335°C showed mixed phases of the zinc blend and wurzite structures. Information about crystallite size is obtained...
A sandwich structure of TiON/Ag/TiON (TAgT) multilayer films was prepared onto glass substrates using RF and DC magnetron sputtering without intentional substrate heating. The thicknesses of each layer in the TAgT films were set at 50nm, 5nm and 45nm. The optoelectrical properties of the TiON films were strongly influenced by the presence of an Ag interlayer. Although the optical transmittance of...
Laser irradiation effects on the hardness of Al 5086 alloy have been investigated by using KrF Excimer laser of 248 nm wavelength, 23 mJ pulse energy, 20 ns pulse duration, and 100 Hz repetition rate. The square-shape samples were irradiated in air as well as in vacuum (∼10 −3 mbar) with a defocused beam of spot size 3.14 mm 2 at the target surface, where the laser fluence was 0.73 J/cm...
The paper presents the results of investigation into the thermal fatigue resistance of thermal barrier coatings (TBC). Two groups of double-layered thermal barrier coatings (TBC) were investigated: plasma sprayed with ZrO 2 -8%Y 2 O 3 , Al 2 O 3 -40%TiO 2 or Al 2 O 3 -40%ZrO 2 top coats and powder flame sprayed with ZrO 2...
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