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High-density plasmas produced by the microwave power coupled in surface wave modes have been studied in order to apply to the material processing. Small targets biased positively beyond a transition voltage are found to emit their materials to the plasma and to form a plume, as seen in Laser ablation, even at the electron current of 2.5A with the target voltage as low as 60V. Deposition of films,...
We propose a new high-rate reactive sputter-deposition method with two sputtering sources for fabricating TiO 2 films. One source operates in a metal mode sputtering condition and supplies titanium atoms to the substrate. The other source operates in oxide mode and works as an oxygen radical source for supplying oxygen radicals to the substrate surface for promoting oxidization of titanium...
The interaction between an ethanol cluster ion beam and a silicon surface was investigated. The sputtering depth of a silicon surface irradiated with an ethanol cluster ion beam increased with acceleration voltage. The number of disordered atoms on the silicon surface irradiated with an ethanol cluster ion beam initially showed a small dependence on retarding voltage and then a steep decrease with...
We have studied the surface morphology of natural single crystal diamond chips machined by 0.5–3.0keV Ar + ion beam irradiation at ion incidence angles of 0°, 30°, 45°, 60°, and 80° with ion doses from 3.4×10 18 ions/cm 2 to 6.8×10 18 ions/cm 2 . The surface of diamond chips machined with 0.5 and 1.0keV Ar + ion beam, at angles of ion incidence from...
A completely flat erosion magnetron 5-inch cathode has been developed for planer magnetron sputtering using a rotating asymmetrical yoke magnet. The yoke magnet was composed of an iron yoke base with a 70mm diameter, an annular outer yoke, a center Fe-Nd-B magnet which was shifted from the yoke base center, and an assisted Fe-Nd-B magnet which was attached to a part of the outer yoke. In order to...
Since the introduction of the planar magnetron by J.S. Chapin in 1974 magnetron sputtering has become the most important technology for the deposition of thin films. Today it has conquered all industrial branches needing high-quality coatings for realization of new or improvement of existing products. The magnetron cathode combines the advantages of economic deposition even on large areas and the...
To develop ECR plasma source for industrial applications, we produced a large diameter ECR plasma and examined radial profiles of the ion saturation current as a function of pressure and power. It was found that ECR plasma uniform over 300mm is produced for pressures higher than 1mTorr and the electron temperature decreases with increasing pressures.
In order to extend the application range of solid lubricant WS 2 , the author adopted a two-step method to prepare WS 2 film; namely, W film was first fabricated on the AISI 1045 steel by magnetron sputtering method, and then treated by low temperature ion sulfuration to obtain WS 2 composite film. XRD was used to analyze the phase structure of the WS 2 composite film;...
TiCN coatings were deposited using a large area filtered arc deposition (LAFAD) technique from Ti targets in a mixture of N 2 and CH 4 gases. CH 4 fraction was varied from 0 to 50% to change the C content in the coatings. Scanning electron microscopy (SEM), x-ray photoelectron spectroscopy (XPS), x-ray diffraction (XRD), and substrate bending method were used to characterize...
Stability tests of two quadrupole mass spectrometers (QMSs) were performed using a two-stage flow-dividing system from the following viewpoints: (1) fluctuation and drift of ion current, (2) repeatability of ion current, (3) change in ion current owing to prior conditions of use, (4) long-term stability of sensitivity, and (5) interference effect. These tests were performed at the pressure from 8 × 10...
Highly conducting AZO/Cu/AZO tri-layer films were successfully deposited on glass substrates by RF magnetron sputtering of Al-doped ZnO (AZO) and ion-beam sputtering of Cu at room temperature. The microstructures of the AZO/Cu/AZO multilayer films were studied using X-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM) and atomic force microscope (AFM). X-Ray diffraction measurements...
ZnO thin films were prepared by reactive RF sputtering on thermally oxidized Si for gas sensing applications. Three VOC vapors were chosen to investigate the response behavior of the prepared ZnO. Acetone, isopropanol and ethanol were tested, and the sensitivity of the sensor toward acetone was the highest (S ∼ 100) for 500 ppm acetone at 400 °C. The largest sensitivity was achieved at 400 °C for...
Diamond-like carbon (DLC) films were deposited on the inner surface of 304-type stainless steel tube with an inner diameter of 10mm by DC glow discharge plasma. The influence of the deposition time, pressure and the ratios of CH 4 in CH 4 /Ar gas mixture on the DLC film deposition were investigated. The images of Scanning Electron Microscopy (SEM) show that the DLC films are featureless...
The films containing C and about 80%SiC were deposited by R F. magnetron sputtering followed with argon ion beam bombardment to enhance the adhere strength of the substrate and then were introduced hydrogen by using hydrogen ion irradiation or high pressure permeation techniques. XPS was used to investigate the sub-surface of these C–SiC films. The results show that, apart from carbon adsorbing hydrogen,...
Amorphous indium zinc oxide (IZO) thin films were prepared on glass substrates by dc magnetron sputtering at room temperature. The resistivity of IZO films could be controlled between 3.8 × 10 −3 and 2.5 × 10 6 Ω cm by varying the oxygen partial pressure during deposition, while keep the average transmittance over 83%. With IZO films as channel layers, whose surface root-mean-square...
Transition metal nitrides coatings are used as protective coatings against wear and corrosion. Their mechanical properties can be tailored by tuning the nitrogen content during film synthesis. The relationship between thin film preparation conditions and mechanical properties for tungsten nitride films is not as well understood as other transition metal nitrides, like titanium nitride. We report the...
TiN/TiC multilayer films were deposited on high-speed-steel (HSS) substrates using pulse biased arc ion plating. For comparison, TiN and TiC films were also deposited. Scanning electron microscopy (SEM), X-ray diffraction (XRD) and Auger electron spectroscopy (AES) were applied to investigate the modulation period thickness, microstructure and content depth distribution of the films, respectively...
Thin films of the glasses Ge 10 Se 90−x Te x (0 ≤x≥ 40) have been prepared by melt quenching technique; thin films were evaporated at a pressure of ≈10 −4 Pa. The optical absorption behavior of these thin films was studied from the reflection and transmission spectrum in the spectral range 200–1200nm. The optical constants i.e optical band gap (E opt ), absorption...
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