The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
In 28nm technology node, developing an enough lithographic process window of PO layer is one of the most basic requirements. Bigger PO DOF means better PO CD uniformity, which is very important to the device performance.
In 28nm technology node, developing an enough lithographic process window of CT layer is very important as CT is just like a bridge between FEOL and BEOL structures. Traditional side SRAF cannot be inserted into specific pitches which have not enough DOF (Depth of Focus), because SRAF insertion will induce sub-rule pitches which may suffer resolution limit issue. So corner SRAF, as the name implies,...
In 28nm technology node, developing an enough lithographic process window of VIA layer became a major challenge in order to meet the requirements of the connectivity between metal lines. It is widely used to size up VIA in order to enlarge VIA process window if the space between VIA holes and VIA enclosed by metal is big enough. But the traditional retarget method has its own limits as the retarget...
The paper presents the results of poly-cut layer lithography process development for 28 nm technology nodes and beyond, which include the simulation of illumination modes, the assessment of tri-layer chemical materials and verification on the silicon wafer. The small sigma illumination mode is considered as the most suitable illumination mode to meet the requirements of resolution and DOF performance...
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.