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International Technology Roadmap for Semiconductors (ITRS) report proposes extreme ultraviolet (EUV) lithography to be the key candidate of lithography tools to manufacture devices at the 22nm node and beyond. The image effects on wafer critical dimensions (CDs) in the EUV lithography are different from the effects in the conventional lithography caused by the off-axis illumination and refelective...
With the 1st NXE:3100, 0.25NA and 0.8σ conventional illumination, being operational at a Semiconductor Manufacturer, we enter the next phase in EUVL implementation. Since 2006 process and early device verification has been done using the two Alpha Demo Tools (ADT's) located at Leuven, Belgium at IMEC and Albany, New York, USA. Now process integration has started at actual Chipmakers sites. This is...
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