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This paper represents a layout solution to reduce the on-chip couplings in between two BALUNs, which is implemented by UMC 28iim CMOS process. In advanced CMOS technology and circuit application applied for higher frequency, couplings are always an issue to be solved, which are mostly coming through substrate, magnetic fields or electric fields. A floating ring is in use to block the magnetic couplings...
A 2.4 GHz linear CMOS power amplifier (PA) for OFDM WLAN application in 65 nm CMOS technology is presented. The cascode PA operating from 3.3 V employs the proposed asymmetric lightly doped drain MOSFET (A-LDD) structure as common-gate stage to sustain large signal stress and 1.2 V core device as common source stage to provide high frequency operation. Beside, dynamic bias technique is used not only...
This study demonstrates an RF active device based on A-LDD (asymmetric lightly doped drain) MOSFET structure which has higher drain to gate and drain to source breakdown voltage due to removing LDD and halo doped region from the drain side. It is suitable to be used in RF PA (power amplifier) design for SoC (system on chip) in advance 65 nm node and below technology. The manufacturing of A-LDD MOSFET...
A Ku-band CMOS low-noise amplifier (LNA) with high interference-rejection (IR), wide gain control range, and low dc power consumption is presented. The LNA consists of two common-gate metal-oxide-semiconductor field-effect transistors interconnected with an interstage parallel tank for the IR. The stacked common-gate stages share the same dc bias current to reduce power consumption and have controllable...
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