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The potential of optical lithography for production of VLSI circuits with design rules below 0.5 pm has been demonstrated by the performance of a first generation laser-based deep ultraviolet wafer stepper. The system, which has been described previously, consists of a fused silica reduction lens and illumination optics and a KrF excimer laser retrofitted to a commercial production tool [1-3]. It...
Two inventions — the bipolar transistor and the integrated circuit — have fundamentally revolutionized the technology of mankind. Within a period of fifty years, the microelectronics industry has increased the number of transistors fabricated on a single piece of semiconductor crystal by a factor of about 100 million, that is, 1.0e10+8, a productivity phenomenon unparalleled in the history of technology...
The potential of optical lithography for production of VLSI circuits with design rules below 0.5 μm has been demonstrated by the performance of a first generation laser-based deep ultraviolet wafer stepper. The system, which has been described previously, consists of a fused silica reduction lens and illumination optics and a KrF excimer laser retrofitted to a commercial production tool [1-3]. It...
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