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The temperature uniformity of thin film process is an important issue for susceptor in high temperature vacuum system. When the temperature of process is extremely high the uniformity is not only difficult to control, but also hard to maintain. In order to raise the temperature utilization at high temperature which is higher than 1300°C, the heating baffle is introduced for this purpose. As the result,...
Numerical analysis provides a way to simulate a high temperature system so that a design of heat source can be cost-effective. This research is in design of two-zone heater for a MOCVD vacuum rector. It makes the temperature deviation on wafer reduced to be ±2% from the 10% in single-zone heater. By the design of such a heat source, the temperature uniformity can be improved and applied to the practical...
Semiconductor equipment usually can be divided into five sub-system modules, (a) heating system, (b) exhausting system, (c) injecting system, (d) power control and (e) vacuum chamber. Metal organic chemical vapor deposition (MOCVD) process is the key process to deposit epitaxy thin film, and the uniformity is determined by the distribution of susceptor temperature. This research focuses on the development...
A MOCVD process requires not only high heating efficiency, but also good temperature uniformity on susceptor surface. The most common material of susceptor is graphite, but the heating lifetime is very short. Instead, this work uses the SiC as susceptor material. It enhances both the lifetime and thermal conductivity. In the meantime, we also change the shape and structure of susceptor to improve...
A fully integrated CMOS voltage-controlled oscillator (VCO) with very low phase noise is presented in this paper. Two filters were employed at top and bottom of the VCO core to maximize the voltage swing and to suppress flicker noise up-conversion. The measured phase noise at 1 MHz offset from a 9.3 GHz carrier is better than -126 dBc/Hz. And the phase noise variation over the whole tuning range (8...
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