The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
A high-voltage lateral double-diffused MOSFET with N-island (NIS) and step-doped drift (SDD) region in partial silicon-on-insulator (PSOI) technology is proposed. In the lateral direction, the SDD region and the NIS on the buried oxide layer (BOX) introduce two additional electric field peaks, which can improve the surface field distribution and breakdown voltage (BV). In the vertical direction, due...
A new 600V Partial Silicon-on-Insulator (PSOI) lateral double-diffused metal-oxide-semiconductor (LDMOS) field-effect transistor with step-doped drift region (SDD) is introduced to improve breakdown voltage (BV) and reduce on-resistance (Ron). The step-doped profile induces an electric field peak in the surface of the device, which can improve the surface field distribution and the doping accommodation...
A generic carrier-based core model for undoped four-terminal double-gate (DG) MOSFET valid for symmetric, asymmetric, SOI, and independent gate operation modes is presented in this paper. Based on the exact solution of the 1-D Poisson's equation of a general DG-MOSFET configure, a generic drain current model is derived from Pao-Sah's double integral in terms of the carrier concentration. The model...
This paper presents a surface-potential-based non-charge-sheet core model for long-channel fully depleted SOI MOSFET. The formulation starts from a physics-based solution of the surface potential and an analytical non-charge-sheet drain current is provided to describe the fully-depleted SOI MOSFET behavior with the coupling between the front and back interfaces. The model calculation is compared with...
This paper presents a carrier-based analytic model for ultra-thin-body silicon-on-insulator (UTB-SOI) MOSFETs. It is based on the exact solution of the Poisson-Boltzmann equation by a carrier approach and the current continuity equation with the back interface oxide layer effect. The mode is valid for all the operation regions (linear, saturation, sub-threshold) and traces the transition between them...
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.