Search results for: M. Visciarelli
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A simulation study on the impact of interface traps (ITs) and strain on the I/V characteristics of co-optimized n- and p-type tunnel field-effect transistors (TFETs) realized on the same InAs/Al0.05Ga0.95Sb technology platform is carried out using a full-quantum simulator. In order to capture the effect of interface/border traps on the device electrostatics in a way consistent with the ballistic approach,...
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The impact of strain and semiconductor/oxide interface traps (ITs) on the turn-on characteristics of a 10×10 nm2 nanowire (NW) Al0.05Ga0.95Sb/InAs heterojunction n-type tunnel field-effect transistor (TFETs) is carefully investigated using a full-quantum simulator. In order to capture the effect of traps on the device electrostatics in a way consistent with the ballistic approach, the SRH theory has...
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A simulation study exploring the possibility of performance improvements related with the application of stress to nanowire TFETs is carried out. It is demonstrated that appropriate strain conditions, i.e., biaxial tensile strain, induce a remarkable enhancement of the on-state current thanks to bandgap reduction. However, a careful optimization of the device cross-section and strain level must be...
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We compare band-structure calculations obtained with modeling approaches hierarchically spanning from density functional theory to tight-binding, k·p and non-parabolic effective mass descriptions. We consider III-V quantum-wells with thickness ranging from 3nm to 10nm. Comparison with experiments for unstrained and strained InGaAs quantum-wells is also reported.
