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This paper provides a nano-scale simulation model to study the UV nanoimprint lithography. Simulation of molecular dynamic is used to calculate the interfacial stress between the mold and pattern-transfer-polymer layer. Energy minimization was performed to find the equilibrium molecule configuration of the material system using the ensemble of the constant number of particles, constant-volume and...
Nanoimprint lithography (NIL) provides a low cost process for nano-pattern mass production. Polymer filling and de-molding processes determine the quality of the imprinted pattern in NIL. In UV-nanoimprint lithography, low viscous polymer reduces the requirement of imprint pressure in polymer filling. The interaction between pre-patterned mold and UV-curable polymer during de-molding greatly affect...
This paper provides a roller type nano-pattern transfer process, which is based on UV nanoimprint lithography, for nano-patterning on both rigid and flexible substrates. By using UV-curable polymer resist, room temperature and low pressure process, which is possible to apply to flexible films, is introduced. PDMS and PVA soft molds that can have conformal contact with large area non-flat substrate...
Low temperature and low pressure nano-pattern fabrication process is presented. Hard mold UV nanoimprint lithography, processed by SUSS MicroTec MA6, was used for sub-100nm pattern fabrication. The process details including mold fabrication are provided. A comparison between patterns on soft mold and hard mold is given. The governing parameters in hard mold NIL process are identified. UV curable resin...
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