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The novel composite amorphous/nanocrystalline thin-film silicon has been fabricated by plasma-enhanced CVD using template porous alumina substrate. The layers possess of specific non-planar morphology and contain silicon nanocrystals of 2-4 nm diameter, as well as ??bunches?? of elongated nanocrystals composing honeycomb-like net. The results obtained could be used in new composite materials and structures...
In this paper, the authors have developed an a-Si TFT process on clear plastic substrates which allows direct transfer of industry a-Si TFT process on glass to plastic substrate for flexible electronics applications. The high temperature process increases the reliability of the a-Si TFT's, which is critical for OLED's where one TFT must operate in a DC condition
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