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Novel morphology of amorphous/nanocrystalline (nanomorph) silicon has been obtained by plasma enhanced CVD using template porous alumina substrate. The growing heterogeneous Si layer is composed of nanocrystalline and amorphous distinct areas, conformal to the tipped/ribbed alumina template. Raman spectroscopy and XRD data evidence the plasma-assisted preferential growth of nanocrystalline Si bunches...
The novel composite amorphous/nanocrystalline thin-film silicon has been fabricated by plasma-enhanced CVD using template porous alumina substrate. The layers possess of specific non-planar morphology and contain silicon nanocrystals of 2-4 nm diameter, as well as ??bunches?? of elongated nanocrystals composing honeycomb-like net. The results obtained could be used in new composite materials and structures...
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