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New transparent gas barrier materials made of thin silicon oxynitride films deposited on polyethylene terephthalate substrates via reactive sputtering in nitrogen plasma have been developed and characterized. The gas barrier properties of these materials have been evaluated and compared with silicon oxide thin films. The oxygen transmission rates of the silicon oxynitride (SiON) films were lower than...
An investigation has been made of the microstructure and the electrical properties of Ag-MgF 2 cermet films, with a high Ag fraction, prepared by vacuum evaporation technique. The results show that the cermet film is composed of mainly amorphous MgF 2 matrix with embedded fcc-Ag nanoparticles. The results also show that the sheet resistance of the Ag-MgF 2 film varies between...
Effect of annealing in the structure and morphology of vacuum deposited thin nickel films are reported. From the X-ray diffraction analysis, the oxidation mechanism observed in the transformation of Ni to NiO suggested that the phase transformation could occur through two oxidation states. The SEM observations indicate that the oxidation of Ni to NiO is controlled by the diffusion of Ni ions through...
A gaseous mixture composed of tetraisopropoxytitanium, nitrogen and hydrogen in the PACVD process, has been used to obtain Ti(NCO) layers of good performance properties, such as a high hardness and good resistance to corrosion and to frictional wear. The temperature of the process is 500 o C. The paper describes a method which permits improving the properties of the Ti(NCO) type and composite...
Ion implantation of aluminum and stainless steel alloys is a useful method for the improvements of their tribological properties and hardness. This paper presents a preliminary study of the influence of titanium implantation on the tribological properties and hardness of the commercial duralumin and stainless steel alloys. The friction, wear and hardness measurements have been carried out at energy...
The mass and energy spectra of the positive and negative ions at a substrate were measured in a pulsed magnetron (20-100kHz) operated in argon, argon/oxygen and argon/helium mixtures. For a better understanding of the origin of high-energy ions and plasma dynamics of the pulsed dc magnetron discharge, time-resolved energy spectra were measured using gating of the ion beam in front of the orifice of...
Cd 0.96 Zn 0.04 Te thin films were prepared by vacuum evaporation onto glass substrates kept at room temperature. X-ray diffraction (XRD) studies revealed that the as-deposited films have zinc blende structure with preferential (111) orientation. Raman peak of the as-deposited film appeared between 139.88 and 163.40cm -1 for the transverse...
Hydrogenated amorphous carbon (a-C:H) films were prepared by plasma enhanced chemical vapor deposition method with three different groups of processing parameters. After being radiated in oxygen plasma for 30min, the properties of all the a-C:H changed significantly. In order to investigate the oxygen plasma effect, Raman spectroscopy, Fourier-transform infrared spectroscopy, atomic force microscopy...
Amorphous SiO 2 (a-SiO 2 ) films were prepared by reactive RF magnetron sputtering method in an oxygen and argon mixture at room temperature. The chemical structure and electrical properties of the films were investigated as a function of the gas volume ratio [O 2 ]/[Ar]. When Ar was fixed at 40sccm and O 2 was increased, deposition rate would decrease firstly, then...
Taguchi's design of experiment method and statistical F-test were used to optimize design of tuning forks for use in Qualcomm ( R) mobile station modem-3000 series central processing unit chips of code division multiple access, personal communication system, and global system for mobile communication systems. Finite element method modeling used in conjunction with Taguchi's method enabled...
The deuterium flow q perm (HD) through a 0.15mm thick stainless steel membrane at 200 o C into vacuum was measured. Deuterium entered the membrane by dissociative adsorption of heavy water (D 2 O) vapour. The q perm (HD) at 200 o C caused by this reaction was measured for two equal membranes; for the first a q per...
The reactivity of O 2 -gas on the low and heavily reduced TiO 2 (110)-p(1x2) surfaces was investigated using impact collision ion scattering spectroscopy (ICISS). We found that the reactivity of O 2 -gas on the low reduced surface which has Ti 2 O unit rows (Appl. Surf. Sci. 167 (2000) 169) is low, while that on the heavily reduced surface with added Ti 2 O...
The suitability of different plasma etch models based on various plasma chemistry has been evaluated for the fabrication of micro-mechanical structures and micro-electro-mechanical systems. Different etch models have been described for silicon etching based on fluorine and chlorine chemistry and the mechanisms involved in SiO 2 etching. Conventional planar reactive ion etching systems have...
Various polymeric and non-polymeric samples were modified by means of plasma polymerisation of isocyanatoethyl methacrylate (IEM) vapour in mixture with argon. The aim of the work was to find the best experimental conditions and compare the down-stream plasma polymerisation and pulsed plasma polymerisation techniques. The IEM was chosen for superior reactivity of its isocyanato group (-N=C=O), predominantly...
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