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Transparent silicon oxide thin films were deposited on polyethylene terephthalate substrates by means of reactive sputtering in oxygen and their gas barrier properties were evaluated. The SiO x film sputtered in 10% oxygen/90% argon mixture of inlet gases showed the lowest oxygen transmission rate, and this rate increased with an increase of inlet oxygen concentration. In addition, the oxygen...
New transparent gas barrier materials made of thin silicon oxynitride films deposited on polyethylene terephthalate substrates via reactive sputtering in nitrogen plasma have been developed and characterized. The gas barrier properties of these materials have been evaluated and compared with silicon oxide thin films. The oxygen transmission rates of the silicon oxynitride (SiON) films were lower than...
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