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A novel maskless nanoscale material etching method based on microcavities dielectric barrier discharge (DBD) array with advantages of high accuracy and high efficiency has been proposed in this paper. A two-dimensional simulation of pyramidal hollow cathode DBD microplasma operated in Ar has been studied using FEM method. Results indicated that high density microplasma with its magnitude of 1e18/m3...
This paper reports a novel maskless nanoscale material etching method based on microplasma devices arrays. That is, inverted pyramidal microplasma devices arrays are integrated into the scanning probe tips array to realize maskless nanoscale material etching with advantages of high efficiency, large area and low cost. A 4×4 inverted pyramidal microplasma device array with each microcavity dimension...
This paper reports a novel maskless nanoscale material etching method based on microplasma reactor array with advantages of high etching efficiency, high fidelity, simple-structure, and flexible to etching various material. A 2×2 inverted pyramidal microplasma reactor array with each cavity dimension of 50µm was successfully fabricated by MEMS process. Experiment results showed that the devices could...
This paper presents a novel maskless microplasma etching method based on scanning probe microscopy. That is, an inverted pyramidal microdischarge is integrated into a hollow tip of a SiO2 cantilever probe, and the generated microplasmas are ejected through the nano -aperture to realize maskless etching with nano -resolution and high efficiency. The SiO2 cantilever with microdischarge and nano-aperture...
A novel maskless micro-nano plasma etching system based on parallel probe actuation is proposed. The advantages of this system are high etching rate, high fidelity, simple-structure, and flexible to fabricate various material. As a key component of the system, a microplasma reactor of metal-dielectric-metal sandwich structure with inverted, square pyramidal hollow cathode is designed and successfully...
In scanning plasma etching process, characteristic parameters of microplasma are the most important influencing factors. Based on the fundamental principle of microplasma etching and the device we fabricated, a set of electrical and optical testing system for our microplasma device was presented in this paper. The electrical and optical signals were collected in the vacuum chamber, then exported to...
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