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One of the steps required during the fabrication of SU-8 mold for soft lithography is softbaking, which is conducted after the deposition of the photoresist. The purpose of softbaking is to stabilize the resist film and eliminate any remaining solvent through evaporation. This ensures that the resist surface is non-sticking, hence avoiding debris when transferring the patterns later. In this paper,...
This paper presents the recent development and fabrication of carbon nanotubes (CNT) based on electrical devices. The silicon oxide is formed by dry oxidation and the Aluminum (Al) layer is deposited using Thermal Evaporator. The electrodes pad act as a bridge for CNT alignment. Then, this single-walled carbon nanotubes (SWNTs) was suspended in isopropyl alcohol (IPA) and Dichloromethane (DCM) solution...
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