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Ge channel is one of the promising performance boosters for replacing Si channel in future complementary metal-oxide-semiconductor technology. The uniaxial stress technology can further enhance the performance of Ge MOSFETs. In this paper, the uniaxial stress effect on Ge NMOSFETs was experimentally and theoretically investigated. The gate dielectric in the Ge NMOSFETs was fabricated by using the...
We demonstrate high performance Ge n-MOSFETs with novel raised source/drain fabricated on high quality single crystal Ge selectively grown heteroepitaxially on Si using Multiple Hydrogen Anealing for Heteroepitaxy(MHAH) technique. Until now low source/drain series resistance in Ge n-MOSFETs has been a highly challenging problem. Source and drain are formed by implant-free, in-situ doping process for...
The performance limits of ultra-thin body double-gated (DG) III-V channel MOSFETs are presented in this paper. An analytical ballistic model including all the valleys (Gamma-, X- and L-), was used to simulate the source to drain current. The band-to-band tunneling (BTBT) limited off currents, including both the direct and the indirect components, were simulated using TAURUStrade. Our results show...
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