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Nanometer sized crystalline (nc) Si formation in the SiH 4 plasma cell with very-high-frequency (144 MHz) excitation has been investigated with the Ar and H 2 dilution method. The SiH 4 plasma cell is attached to the ultra-high-vacuum chamber. The crystalline Si is formed in the gas phase of the plasma cell by coalescence of radicals produced from SiH 4 . The nc-Si...
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