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With the increasing miniaturization of electronic devices and systems, the dimension of solder joints and pitches has been continuously scaling down, while the current density carried by solder joints increasing significantly, consequently a critical issue, electromigration (EM), has become a key reliability concern. The EM behavior in the solder joint is mainly dependent on the magnitude and distribution...
Dimension of solder interconnects (or joints) and pitches has been continuously scaling down, resulting in inhomogeneous microstructure and severe electromigration (EM) effect in solder interconnects. In this study, the interaction effect between electromigration and microstructure evolution in ball grid array (BGA) structure Cu/Sn-58Bi/Cu solder interconnects under a direct current density of 1.5×10...
Dimension of solder interconnects (or joints) and pitches has been continuously scaling down, resulting in inhomogeneous microstructure and severe electromigration (EM) effect in solder interconnects. In this study, the interaction effect between electromigration and microstructure evolution in ball grid array (BGA) structure Cu/Sn-58Bi/Cu solder interconnects under a direct current density of 1.5×10...
The interaction effect between electromigration (EM) and microstructure evolution in Cu/Sn-58Bi/Cu solder interconnect with asymmetric configuration along current direction was studied by cellular automaton (CA) modeling embedded with finite element (FE) simulation, with a comparison to in-situ scanning electron microscope (SEM) observation and focus ion beam (FIB) microanalysis. The CA method was...
The influence of the pre-existing void in the Cu/Sn-58Bi/Cu solder joint on electromigration behavior was investigated by in-situ SEM observation and focused ion beam (FIB) analysis. The results show that the void with smooth internal surface has no influence on the Bi atom migration, while the one with a sharp notch may easily result in Bi atom congregation and further lead to the formation of cracks...
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