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Parameter variations in nanometer process technology are one of the major design challenges. They cause to be increased delay on the critical path and to change the logic level of internal nodes. The basic concept to solve these problems at the circuit level, design-for-variability (DFV), is to add error handling circuits at the conventional circuits so that they are robust to nanometer related variations...
The advanced nanometer circuits are susceptible to errors caused by process, voltage, and temperature (PVT) variation and single event upset (SEU). The state-of-the-art variation-aware flip-flops (FFs) only detect the errors with high overheads. We propose two design-for-variability (DFV)-aware flip-flops (edge-sensitive FF and pulsed FF) which can handle reliability problems efficiently. The HSPICE...
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