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In this paper, the impact of fin number on device performance and hot carrier induced device degradation was investigated for n-channel tri-gate multi-fin FinFET with different fin numbers. The threshold voltage (VTH) shift, transconductance, and subthreshold swing degradation were extracted to determine the degradation of device. It was found that the device with fewer fins shows better device performance,...
Though Silicon Vias(TSVs) are regarded as a key technology to achieve three dimensional(3D) integrated circuit(IC) functionality. Annealing a silicon device with TSVs may cause high stress and cause TSV protrusion because of high Coefficient of Thermal Expansion(CTE) between silicon substrate and TSVs. The TSV wafers could be annealed right after copper plating process, or after chemical mechanical...
Though Silicon Vias(TSVs) are regarded as a key technology to achieve three dimensional(3D) integrated circuit(IC) functionality. Annealing a silicon device with TSVs may cause high stress and cause TSV protrusion because of high Coefficient of Thermal Expansion(CTE) between silicon substrate and TSVs. The TSV wafers could be annealed right after copper plating process, or after chemical mechanical...
Through silicon vias (TSVs) are regarded as one of the key enabling component to achieve three-dimensional (3D) integrated circuit (IC) functionality. In this paper, we present the investigation on TSV protrusion and stress at different annealing conditions tested by means of optical profiler and high efficiency micro-Raman microscopy. Finite element method is utilized to model and simulate the thermo-mechanical...
In this letter, performance and reliability of high- /metal gate MOSFETs can be effectively improved using postmetallization annealing. Both oxygen and nitrogen were shown to diffuse into a high-/ interfacial layer to suppress the formation of oxygen vacancy, thus reducing the gate leakage current without increasing effective oxide thickness. In particular, with appropriate oxygen...
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