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We experimentally demonstrate a double-etched apodized fiber-to-waveguide grating coupler in silicon-on-insulator for high efficient coupling. The device fabricated using deep UV photolithography exhibits a coupling loss of -1.5 dB with 3-dB bandwidth of 54 nm.
Institute of Microelectronics, A∗STAR (Agency for Science, Technology and Research) 11 Science Park Road, Singapore Science Park II, Singapore 117685 Vertical Cu-insulator-Si hybrid plasmonic waveguides (HPWs) along with various passive components are fabricated on a silicon-on-insulator platform using standard complementary metal-oxide-semiconductor (CMOS), technology and characterized at 1550-nm...
The Si3N4 waveguide offers very low propagation loss and feasibility for three-dimensional photonic integration, but it suffers from large optical mode size (thus low integration density) due to the relatively small refractive index contrast between the Si3N4 core and the SiO2 cladding. On the other hand, the metal-insulator-metal plasmonic waveguide offers very tight light confinement but it suffers...
Subwavelength horizontal Al/SiO2/Si/SiO2/Al plasmonic slot waveguides with SiO2 width at each side of ~15 nm and Si width of ~136, ~87, and ~43 nm are fabricated on SOI substrates using fully CMOS compatible processes. The propagation losses at 1550 nm TE are ~1.01, ~1.31, and ~1.56 dB/μm, respectively, as measured by the standard cutback method. A simple taper coupler with length of ~0.3-1 μm provides...
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