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In order to reduce scratches attributed to the CMP (chemical mechanical planarization) polishing processes, defect-causing large particle counts must be reduced to improve semiconductor yields. CMP slurry filtration is considered as a critical enabler of these yield improvements. As the process technology advances, the abrasive concentrations of CMP slurries will continue to be lowered while abrasive...
Reduced device feature size and new device manufacturing processes require more efficient management and control of the chemical mechanical planarization (CMP) process. One of the key parameters to lower defectivity is to control contaminants through the use of a CMP filter operation [1]. This paper discusses CMP slurry filtration methodologies and mechanisms along with the relationship between particle...
A local cell-averaging fast CFAR scheme is proposed for multi-target ship detection. The proposed algorithm is based on global censoring scheme to avoid multitarget situation in reference cell. Fast CFAR scheme is employed to reduce computational load. Local average in the vicinity of test cell can remove small sized false alarms so that additional binary clustering is not required for final decision...
It is found that the morphologies and orientations of Cu6Sn5 can be well controlled through designing orientations of Cu single crystal substrates. On (001) and (111) Cu single crystals, Cu6Sn5 grains display regular prism-type morphology and align either along two perpendicular directions or along three directions having an angle of 60deg between each other. By electron backscatter diffraction (EBSD)...
Knowledge workers reuse knowledge to identify problem, to recognize problem, and to resolve the problem. Knowledge steams within group provide professional connections among team-members. Problem-based learning is the bridge to connected learner with real world and is the trigger setting for high level thinking skill. On-line technology is supporting our learning in many ways. There is a need to understand...
The shallow trap energy in SONOS charge-trapping flash (CTF) is the fundamental challenge for required good retention, especially at elevated temperatures. Although the high temperature retention can be improved by BE-SONOS, this is traded off the slow erase speed. To address these issues, we have fabricated a new charge-trapping-engineered flash (CTEF) using deep trapping high-dielectric to replace...
In reverse engineering, noise needs to be processed, which is in existence among measured data. The result data processed directly influences the reconstructed curve and surface precision. In order to acquire point cloud data which can truly reflect the original design view, an improved fairing algorithm with optimized modification amount is proposed. The fairing process includes two blocks: rough...
Here we demonstrate two novel approaches to on-chip optofluidic transport. We show the trapping of polystyrene microspheres using SU-8 waveguides down to 75 nm polystyrene nanoparticles and linear lambda-DNA using silicon slotted waveguides.
This study proposes a simple and fast technique for detecting wafer cutting lines using the Affine transformation before sawing. This technique was developed for the purpose of wafer alignment when alignment marks are unavailable. The edges of the pre-sawing lines are complex and there are bright shapes in the sawing lines, so it is difficult to apply the conventional edge finding method. The sawing...
A humanoid robot is a complex machine with many degrees of freedom. And, the control at the joint level is a crucial step for a humanoid robot to achieve fast and accurate movements. In this paper, we address the issue of gravity compensation, and propose a learning approach which is inspired by a human-like scheme of compensating gravity through learning. First of all, we will describe the importance...
We have compared the device performance of double-quantum-barrier charge-trapping memory of a TaN/Ir3Si-[HfAlO-LaAlO3]-HfON0.2-[HfAlO-SiO2]-Si device with single barrier non-volatile memory MONOS devices at close EOT. At 150??C under fast 100 ??s and low ??9 V P/E, the double-quantum-barrier charge-trapping device shows a 3.2 V initial ??Vth and 2.7 V 10-year extrapolated retention. This retention...
At 150degC under a fast 100 mus and low plusmn9 V P/E voltage, the [TaN-Ir3Si]-HfAlO-LaAlO3-Hf0.3O0.5N0.2-HfAlO-SiO2-Si memory device shows good device integrity of a 3.2 V initial DeltaVth and 2.4 V 10-year extrapolated retention. This only 25% retention decay at 150degC was achieved by double quantum barriers confining trapped carriers in deep Hf0.3O0.5N0.2 well.
We demonstrate strongly enhanced optical trapping forces on sub-micron-diameter dielectric spheres within a pressure-driven microfluidic flow of several hundred μm/s using the evanescent field of the light in silicon waveguides.
We propose a self-learning method for automatic wafer alignment in the semiconductor manufacturing process. A feed forward neural network is trained by and used for wafer alignment. The network determines the movement of kinematic parts from the misalignment inspected by machine vision. However, it is time-consuming and inconvenient to obtain training data in this way. So, we built an automatic learning...
The article consists of a Powerpoint presentation on methods for technology level assessment of five key technologies by using R&D analysis. The five key technologies are digital broadcasting; bio-signal analysis; secondary batteries; high performance and multifunctional textile materials; and environmentally friendly marine cultivation.
Mathematical model for automatic alignment of wafers was derived under the assumption of the ideal condition of alignment marks. Because wafers were fabricated under nonideal conditions at the factory level, the wafers were difficult to handle during the manufacturing process. The difficulty arose from distortion due to dust, water and contaminant. The errors from the distortion could be reduced when...
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