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An amorphous-silicon thin-film transistor (TFT) process with a 180 degC maximum temperature using plasma-enhanced chemical vapor deposition has been developed on both novel clear polymer and glass substrates. The gate leakage current, threshold voltage, mobility, and on/off ratio of the TFTs are comparable with those of standard TFTs on glass with deposition temperature of 300 degC-350 degC. Active-matrix...
In this paper, the authors have developed an a-Si TFT process on clear plastic substrates which allows direct transfer of industry a-Si TFT process on glass to plastic substrate for flexible electronics applications. The high temperature process increases the reliability of the a-Si TFT's, which is critical for OLED's where one TFT must operate in a DC condition
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