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Complementary MOSFET and Tunnel-FET inverters based on tri-gated strained Si nanowire arrays are demonstrated. The voltage transfer characteristics as well as the inverter supply currents of both inverter types are analyzed and compared. A degradation of the inverter output voltage is observed due to the ambipolar TFET characteristics. Emulated TFET inverters based on the measured transfer characteristics...
This paper presents experimental results on tunneling field-effect transistors (TFETs) based on SiGe on SOI nanowire arrays. A SiGe-Si heterostructure TFET with a vertical tunneling junction consisting of an in situ doped SiGe source and a Si channel is demonstrated. The device shows switching behavior over a drain current range of up to 8 orders of magnitude with a minimum slope of 90 mV/dec. A larger...
This paper presents experimental results on metal oxide semiconductor field-effect transistors (MOSFETs) featuring an array of 1000 trigated uniaxially strained nanowires with a cross-sections of 15 × 15 nm2 in combination with a HfO2/TiN gate stack. The high uniaxial strain along the wires reduces the band gap energy by approximately 140 meV and enhances the electron mobility. Ideal inverse subthreshold...
This letter presents experimental results on tunneling field-effect transistors featuring arrays of -gated uniaxially strained and unstrained silicon nanowires. The gate control of a gate stack is compared with a high-/metal gate stack. Steep inverse subthreshold slopes down to 76 mV/dec and relatively high on -currents were achieved with the combination of high-...
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