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A physics-based silicon-germanium (SiGe) heterojunction bipolar transistor (HBT) aging model for mixed-mode stress based on the lucky-electron model and reaction-diffusion theory is developed for integration with compact models. An effective aging parameter extraction method is described, and the aging model parameters are fit for a modern SiGe HBT platform. The aging model is implemented as a wrapper...
An empirical reliability model is proposed here that is able to predict parameter degradation for a SiGe Hetero-junction Bipolar Transistor (HBT) by scaling stress time laterally producing a universal curve that describes whole time evolution of degradation. The predictability of the degradation pattern is demonstrated in experiments at a forward active mode as well as the reverse Veb stress accounting...
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