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In this paper, the effects of Cu microstructure on the mechanical properties of TSV and via extrusion are studied using two types of through-silicon vias (TSVs) with different grain size distributions. A direct correlation is found between the Cu grain size and the mechanical properties of the TSVs. An analytical model is used to explore the relationship between the mechanical properties and via extrusion...
In this work, the effect of high temperature storage (HTS) on the stress in and around Cu TSVs in 3D stacked chips is studied by scanning white beam x-ray microdiffraction. The x-ray microdiffraction measurements were conducted on different die levels in the stacked chips before and after HTS test. High resolution mappings of stress distribution were obtained and compared between pre-HTS and post-HTS...
The characteristics of thermal stresses in a five-stacked memory dies containing through-silicon vias (TSVs) were measured with synchrotron x-ray microdiffraction. The measurements were performed in and around the Cu vias for both the top and bottom dies. With scanning white beam x-ray microdiffraction, high resolution mappings of stress distribution were obtained. The results provided a direct observation...
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