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In immersion lithography, a single exposure resolution of 36.5 nm half pitch (k = 0.255) has been demonstrated with a numerical aperture of 1.35. However the practical resolution limit in production will be closer to 40 nm half pitch (k = 0.28), without involving double patterning alike strategies, such as self-aligned double patterning (SADP). While for the practical resolution limit with k value...
Interaction between urban development and transportation network is closely related. In this paper, its were elaborated that space-time non-equilibrium of the Interaction strength, its temporal succession of Interaction mode and its spiral interaction process, etc, which was the law of Interaction between Urban system and transport network and was helpful for a better understanding of the development...
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