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Microwave assisted reactive sputtering was applied to obtain homogeneous and high optical quality ITO thin films with thickness of 50, 100, 200 and 280 nm. Electrical properties of deposited ITO thin films were measured using standard four-point probe method together with transmission spectra of ITO thin films in the wavelength range from 330 nm to 880 nm. The figure of merit calculated for all samples...
In this work thermoelectrical properties of TiO2:(Co, Pd) and TiO2:Nb thin films have been described. Thin films were performed by high energy magnetron sputtering method. Sputtering process was carried out from mosaic targets under low pressure of oxygen reactive gas. Electrical and thermoelectrical properties of as deposited and annealed at 800 K thin films were analyzed based on resistivity and...
Transparent conducting indium-tin oxide (ITO) thin films play a very important role in the field of optoelectronic devices such as photovoltaic cells and flat panel display devices. ITO films display low electrical resistance and high transmittance in the visible range of the optical spectrum. ITO thin films were deposited using a magnetron sputtering with a microwave source to improve the plasma...
In the present work usefulness of spectrophotometry and ellipsometry for the determination of different parameters of optical thin films have been discussed. The principles of their operation and some exemplary results for TiO2 thin films deposited by magnetron sputtering are presented.
Examples of ARCs designed for ophthalmic lenses and solar cells applications are presented. It have been shown, that for a conventional silicon solar cell a single TiO2 thin film allows to reduce the silicon surface reflection to less than 3%. In case of optical lenses, fabricated from a crown glass, few examples of single and multilayer systems with different layers arrangement have been presented...
Nowadays, much attention is paid to thin films surface wettability parameter. Hydrophobic coatings are well used for water repellant materials, while hydrophilic thin films are often used in anti-fogging applications. Titanium dioxide is one of the best materials for thin film coatings applications, due to its electrical, optical, chemical and physical properties such as photocatalysis, high transparency...
In this work structural properties of TiO2 thin films doped with different amounts of Nd have been presented. Thin films were deposited on silicon substrates using high energy reactive magnetron sputtering process and for the measurements TiO2 doped with 0.84 at. % and 8.51 at. % of Nd have been selected. Diversification of the thin film surface was investigated using atomic force microscope. The...
In this paper new magnetron sputtering system for multilayers deposition has been presented. The system allows sputtering of different materials from 4 targets in low pressure of working and reactive gas (oxygen, argon, oxygen + argon). Manufactured structures can be build from films, which have gradient concentration of dopant. Also the doping process can be performed with high precision in continuous...
In this work nanocrystalline titanium dioxide thin films doped with Eu have been presented. Structural investigation results have shown that amount of Eu in TiO2 matrix has meaningful influence on properties of the thin films, particularly on TiO2 phase and grain sizes. Our measurements have shown that Eu increases photocatalytic activity of TiO2. Eu also has high influence on adsorption of OH- groups...
In this work structural, electrical and antistatic properties of TiO2 thin films doped with different amount of V have been presented. It was shown that the doped thin films are semiconductors in room temperature. The amount of V dopant has a great influence on resistivity of prepared thin films similarly as annealing at 400degC. The time of static charge dissipation from the thin films surface dropped...
Present work is concentrating on TiO2 thin films doped with Pd, Eu and Pd, Tb and Pd. From comparison of undoped TiO2 with the prepared thin films it has been concluded that doping with Pd gets worse transparency in analysed films and the fundamental absorption edge was shifted to the longer wavelength range. The electrical properties were studied by thermoelectrical measurements. The lowest resistivity,...
In this work photoelectrical properties of the thin films based on TiO2 have been presented. Thin films were deposited by high energy (HE) magnetron sputtering process. The properties of thin films were modified by doping with Tb and Pd. Structural studies performed with X-ray diffraction measurements, have shown that after deposition rutile phase in TiO2:(Tb, Pd) thin films was received. The results...
In this paper nanocrystalline thin films of TiO2 doped with Tb have been investigated. Thin films were deposited on different (silicon and glass) substrates using modified magnetron sputtering method named High Energy. Structural properties were examined by X-Ray Diffraction (XRD) method. The results have shown, that phase and average crystallites size of prepared thin films were determined by the...
Integration of electronics and photonics causes greater requirement for development of electrical and optical activated thin films for a new field of application known as transparent electronics. One of the key materials which is necessary for production of functional elements in transparent electronics devices are transparent oxides semiconductors (TOSs). The TOSs can be applied in many practical...
In this work, influence of magnetron sputtering parameters on structural properties of TiO2 thin films has been outlined. Titanium dioxide thin films were deposited on silicon substrates using reactive magnetron sputtering method. Structural properties of deposited thin films were investigated by X-ray Diffraction (XRD), while diversification of surface topography was examined using Atomic Force Microscopy...
Doping of TiO2 with various metal ions can modify its different properties. In this work, structural properties of transparent Tb-doped TiO2 thin films have been outlined. Thin films were deposited by high energy reactive magnetron sputtering (HE RMS) from metallic Ti-Tb target on Si and SiO2 substrates. Thin films were investigated by means of energy disperse spectrometry (EDS), X-ray diffraction...
In this work, optical and electrical characterization of transparent Eu and Pd-doped TiO2 thin films have been presented. Thin films were deposited by low pressure hot target reactive magnetron sputtering form metallic Ti-Pd-Eu mosaic target on silicon. It has been shown that incorporation of Pd and Eu dopants into TiO2 matrix could modify its properties to obtain electrically and optically active...
In the present work the properties of mixed HfxTi1-xO2 solid solution thin films in metal-oxide-semiconductor (MOS) configuration have been studied. Thin films, were grown on monocrystalline silicon substrates using the low pressure hot target reactive sputtering from the Ti:Hf mosaic target. From optical transmission measurements the 3.42 (eV) bandgap of the thin films has been estimated. Electrical...
Transparent oxide semiconductors (TOSs) based on TiO2-doped matrix have been recently studied for their possible microelectronics applications. In the present work, TiO2 and Hf-doped TiO2 thin films were prepared by low pressure hot target reactive magnetron sputtering (LP HTRS) and deposited onto monocrystalline (100) silicon substrate. After deposition thin films were additionally annealed in air...
In this work, an application of two non-destructive beam injection methods: Electron Beam Induced Current (EBIC) and Light Beam Induced Current (LBIC) for evaluation of electrical properties of grain boundaries in polycrystalline silicon solar cells have been described. The methods reveal study of the lateral distribution of the current generated by focused electron and light beams and thus the study...
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