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Soft photocurable nanoimprint lithography has been used to pattern (100) GaAs substrate into periodic nucleation sites for the growth of InAs site-controlled quantum dots (SCQDs). The pattern is a two-dimension square array of nanopores with size ranging from 60 to 110nm, which is tunable by adjusting imprint process parameters. Under the same growth conditions, we demonstrated single-dot occupancy...
Soft lithography followed by etching is used to pattern compound semiconductor pieces with dense arrays of sub-100 nm features. A variety of possible applications in nanophotonics and optoelectronic devices are discussed.
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