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In this study, OES (Optical emission spectrometer) was used to diagnose the variations of plasma species. QMS (Quadrupole mass spectrometry) was utilized to examine the concentration of free radicals in plasma. The epitaxial silicon thin film was deposited by electron cyclotron resonance chemical vapor deposition (ECR-CVD). The film properties related to thickness and crystallinity were investigated...
We report here the fabrication of comb drive III-nitride micro mirror on an III-nitride/silicon platform. Silicon substrate is first patterned from the backside and removed by deep reactive ion etching (DRIE). III-nitride microstructures are defined on freestanding III-nitride slab by backside alignment technique and generated by fast atom beam (FAB) etching. The fabricated comb-drive III-nitride...
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