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The macroscopic dielectric response of insulating materials, like apparent conductivity or space charge features is known to be sensitive to electrode and interface properties in a general sense. To unravel the detailed properties (chemical, topological, microstructural) controlling electronic properties, specific methods need to be implemented. The present contribution addresses the electrical, as...
A new concept concerning dielectric engineering is presented in this study aiming at a net improvement of the performance of dielectric layers in RF MEMS capacitive switches with electrostatic actuation and an increase of their reliability. Instead of synthesis of new dielectric materials, we have developed a new class of dielectric layers that gain their performance from design rather than from composition...
The proposed approach in this contribution concerns plasma deposition processes for engineering of multifunctional materials. It opens the way for transition from material level of development to system level of applications. This concept is applied for deposition of nanocomposite thin layers comprising a single layer of silver nanoparticles (AgNPs) embedded in silica-like host matrices at a controlled...
New dielectric-engineering concept is developed intending a net improvement of the performance of dielectric layers under electrical stress. Instead of synthesis of new dielectric materials a new class of dielectric layers that gain their performance from design rather than from composition is established. Two kinds of nanostructured dielectric layers are presented here: (i) silicon oxynitride layers...
This work presents a study on the charge injection and control of dielectric charging phenomenon in thin dielectric layers with tailored interfaces. Single layer of silver nanoparticles (Ag-NPs) was deposited on thermally grown SiO2 layer and covered with plasma deposited thin organosilicon SiCO:H layer. Thus, the Ag-NPs layer can be located at different distances from the surface with Ag-NPs representing...
Charges accumulation and injection in dielectric material remains critical because it is related to a lot of applications or issues. A deep understanding of interfaces phenomena is needed, but classical space charges techniques exhibit less resolution than the required one. Atomic Force Microscopy (AFM) because of its sensitivity to electrostatic force and its high resolution (close to nanometer)...
In this work, we demonstrate the excellent charge retention capability of spin-coated Polymethylmethacrylate (PMMA) 200 nm thin films previously charged by atomic force microscopy. In order to elucidate the mechanisms involved in the charge transport and charge storage in PMMA films, the conductivity of 200nm thin PMMA films was analyzed on Metal-Insulation-Metal (MIM) structures. A wide range of...
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