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We fabricate Si nano-grating layers and measure their electrical characteristics to monitor geometry induced doping. SOI device layer was thinned down by thermal oxidizing and subsequent wet etching of the oxide. Grating was fabricated using laser interference lithography (375nm laser) followed by reactive ion etching of Si. Next, large square island (0.5x0.5mm) was shaped in the device layer and...
Boron carbide is widely used materials for its attractive combination of properties such as high hardness, low density, high melting point, excellent thermoelectric properties, etc. As well, sintered boron carbide is commonly used, also its powder is applicable for many areas of industry. The aim of study was produce nanopowders and dense bodies of B4C via Spark Plasma Sintering (SPS). Fast and effective...
There were elaborated a new technology for the fabrication of nanocrystalline hard metals of a new class based on titanium carbide assigned for the production of articles with wear-resistant, high temperature strength and refractory properties, e.g.: skins of space rockets, jet engine nozzles, combustion engines, radiation resistant first walls of nuclear reactors, armoring jackets, machine armors,...
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