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In this article, the detection of ammonium (NH 4+ ) ion using nanoscaled 2-nm thick atomic layer deposition (ALD)-hafnium oxide (HfO 2 ) films with post rapid thermal annealing (RTA) and carbon tetrafluoride (CF 4 ) plasma treatments based on light-addressable potentiometric sensor (LAPS) was investigated. 2-nm thick ALD-HfO 2 films with post RTA and CF 4 ...
In this work, discussing the detection of NH4+ ion based on LAPS with functionalized 2 nm-thick ALD-HfO2 film using RTA and CF4 plasma is demonstrated. The annealing treatment at 500, 700, and 900°C were performed on ALD-HfO2 film and the plasma treatment for 1, 3, and 5 min were performed on ALD-HfO2 film with 900°C annealing. In the results, the response for NH4+ ion detection was decreased with...
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