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New device architectures and materials are being introduced to develop 10 and 7 nm node manufacturing processes. In addition, the increasing complexity of multiple patterning adds significant yield challenges. The critical metrology challenges for yield assurance include defect control, control of critical dimension and critical dimension uniformity, and pattern placement control. To support the industry...
This paper presents results pertaining to sequential methods for support recovery of sparse signals in noise. Specifically, we show that any sequential measurement procedure fails provided the average number of measurements per dimension grows slower then D(f0∥f1)−1 log s where s is the level of sparsity, and D(f0∥f1) the Kullback-Leibler divergence between the underlying distributions. For comparison,...
In this paper, we revisit the problem of signal detection in multipath scattering. Specifically, we explore the effect of bandwidth and signaling duration on non-coherent signal detection in doubly dispersive non-uniform multipath scattering environments. In such environments, we conjecture that detection performance is optimized if two conditions are met: C1) the number of independent degrees of...
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