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Nano-porous silicon films have drawn significant attention for the realization of light emitting diodes on silicon substrates. We report a novel low temperature fully radio-frequency plasma hydrogenation assisted process to realize light emitting diodes on glass substrates. Such devices can be of great importance for lighting applications, as an alternative approach for organic LED's or I-V compounds...
A novel method for the fabrication of silicon nanostructures on silicon substrates is reported. This technique relies on a hydrogenation-assisted high aspect ratio plasma etching of silicon substrates capable of producing nanowires and microstructures. The deep vertical etching process consists of sequential oxygen-passivation and SF6-etching of silicon at a record low density plasma of 0.25-0.5W/cm...
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