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Low propagation losses have been measured for a one missing row photonic crystal waveguide on InP membrane operating in the slow light regime. This opens the route to optical pulse processing.
Adding N2 into Cl2-based plasma discharges during the etching of InP-based photonic crystal in ICP-RIE system is shown to produce smooth sidewalls through the passivation of the etched surfaces. Here we present that the addition of BCI3 into this discharge allows to produce smooth and also vertical profiles in InP-based PhC structures. Positive ion current densities have been measured to characterize...
We have fabricated two-dimensional InP-based photonic crystal structures using Cl2/Ar inductively coupled plasma etching. Etched depth of 2.8 mum is obtained for 240 nm hole diameter with a nearly vertical shape. With this recipe, we are able to etch small features, as small as 110 nm, down to 1.9 mum. Optical qualification shows 80 dB/cm propagation losses in W3 InP/InGaAsP/InP photonic crystal waveguide
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