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The electromigration (EM) performance of pristine and ZrO2 doped Sn58Bi solder was studied using line-type structure, in order to reduce current crowding at the solder/pad interface. Cu/solder/Cu interconnects were applied with a direct current of 2.5 A, which generated a current density of 7.96×103 A/cm2, and stored in an oven at a temperature of 70 °C. After 300 hours current stressing, samples...
In this paper, a novel nano-scale conductive film which combines the advantages of both traditional anisotropic conductive adhesives/films (ACAs/ACFs) and nonconductive adhesives/films (NCAs/NCFs) is introduced and developed for next generation high performance ultra-fine pitch packaging applications. This novel interconnect film possesses the properties of electrical conduction along the z-direction...
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