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The outgassing of e-beam resist materials has to be carefully considered in the research and development of multi e-beams lithography. The release of hydrocarbonaceous species by outgassing in high-vacuum e-beam exposure tool is indeed unavoidable and may lead to premature contamination of optics projection systems. Such a contamination may affect the incident electrons path and hence the final imaging...
The developing multi e-beam lithography tools face important challenges in controlling the contamination of the optics system due to the deposition of hydrocarbon layer induced by the resist outgassing under e-beam radiation and high-vacuum. In this work, we present an experimental methodology allowing the investigation of the specific silicon micromachined membranes (called mimics) carbonaceous contamination...
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