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The integration of silicon nanocrystal (Si-nc) nonvolatile memory (NVM) arrays with HfAlOx based interpoly dielectric (IPD) is presented for the first time. The data obtained on array vehicles programmed in Fowler-Nordheim operation regime are in excellent agreement with previously presented results on single cells, as well as theoretical data and allow the evaluation of the scalability of the Si-nc...
In this paper, different Hf-based oxides (HfO2, HfSiO under several annealing conditions, HfSiON, HfAlO with various compositions) are simultaneously considered as storage layers of charge-trap memories. Based on material characterization analyses, electrical data of memory cells, physical modeling of charge-trap devices, we show that a strict relationship exists between the crystal structure of the...
Replacing the tunnel oxide of non-volatile memories by a high-k dielectric is addressed in this paper. This work reports in its first part an experimental study of conduction and trapping in Al2O 3 layers. The experimental data of these layers is then integrated in a novel endurance model suitable for flash memories with high-k tunnel oxide. Simulation results show that low (+8/-7V) operating voltages...
In this paper we propose a purposely designed instrumentation and the experimental set-up for the detection of single-electron phenomena in solid-state non-volatile memories based on silicon nanocrystals floating gate MOSFET. The stepwise evolution of the drain current of a memory cell, after a "write" operation, is monitored by means of a purposely designed low noise acquisition system...
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