The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
This paper reports a novel maskless nanoscale material etching method based on microplasma reactor array with advantages of high etching efficiency, high fidelity, simple-structure, and flexible to etching various material. A 2×2 inverted pyramidal microplasma reactor array with each cavity dimension of 50µm was successfully fabricated by MEMS process. Experiment results showed that the devices could...
Microplasma has been applied widely in micro fabrication. The diagnostics of microplasma generated in the scanning plasmas etching system is critical during the system operation. An experimental system is setup to investigate microplasma parameters of the dc-driven microplasmas reactor operating in CHF3 reactive gases at different gas pressure. The electron density and temperature was calculated from...
This paper presents a novel maskless microplasma etching method based on scanning probe microscopy. That is, an inverted pyramidal microdischarge is integrated into a hollow tip of a SiO2 cantilever probe, and the generated microplasmas are ejected through the nano -aperture to realize maskless etching with nano -resolution and high efficiency. The SiO2 cantilever with microdischarge and nano-aperture...
A novel maskless micro-nano plasma etching system based on parallel probe actuation is proposed. The advantages of this system are high etching rate, high fidelity, simple-structure, and flexible to fabricate various material. As a key component of the system, a microplasma reactor of metal-dielectric-metal sandwich structure with inverted, square pyramidal hollow cathode is designed and successfully...
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.