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In conventional SiP (System in Package), several semiconductor chips had been 2D arranged in an interposer and a mother board. However, it is difficult to downsize and improve the performance of electronic devices due to that large area is occupied by the chips. Recently, 3D packaging technology has been investigated to reduce size of devices and to improve performance of semiconductor devices [1-11]...
Thermal stresses around void in TSV (Through Silicon Via) structure in 3D SiP were discussed under the conditions of device operation and reflow process by using FEM (Finite Element Method). In case of the condition of device operation, equivalent stress around void inside Cu TSV was estimated at around 100 MPa. It showed the low possibility for low cycle fatigue of Cu TSV under device operation because...
In this study, the required heat transfer coefficient of heat sink is quantitatively shown by steady heat conduction simulation. Maximum principal stress of silicon and equivalent stress of the TSV are obtained from thermal stress simulation.
The relation between maximum temperature in Si chip and varied heat transfer coefficients of heat sink is shown in Fig. 5. Maximum temperature for device operation was assumed to be 85 °C. Heat transfer coefficient of heat sink at device operation is estimated to be 4.5W/m2K by quadratic approximation of least square method. Maximum temperature of 3D SiP was almost 85 °C and uniform temperature distribution.
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