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ZnO nanowire devices were fabricated from top-down using optical lithography. The nanowires are formed from anisotropic etch of 100 nm Filtered Cathodic Vacuum Arc (FCVA) deposited ZnO thin film. The nanowires are characterized using SEM and Raman spectroscopy via image mapping. The current-voltage characteristics showed a typical ohmic behaviour after contact annealing, reflecting the influence of...
In this article, we report an extensive study of mass density variations with increasing thickness of many nanofilms (Al, AlN, Cr, Cu, SiC, SiO2, Si3N4 and ZnO) deposited on several substrates (MgO, quartz and stainless steel). From, the analysis and the results quantification, it was found that the mass-density dependence showed dispersive behaviours: increasing layer thickness leads to an initial...
In this study, zinc oxide (ZnO) and aluminium doped zinc oxide (ZnO:Al) thin films were deposited by reactive chemical pulverization spray pyrolysis technique on heated glass substrates at 450degC. X-ray diffraction (XRD), scanning electron microscopy (SEM) and third harmonic generation (THG) are used to characterize their structure , morphology and nonlinear optical properties as a function of Al...
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