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Polysiloxanes with pendant aminopropyl groups were reacted with 4,4'-oxydiphthalic anhydride (ODPA), when crosslinking occured by formation of the bisimide bridges. The samples have been investigated by FTIR spectroscopy, thermogravimetric analysis, dynamic vapor sorption, and dielectric spectroscopy.
In this paper, we have studied the application of metallated porphyrin self-assembled monolayer (SAM) as a copper diffusion barrier for low-k inter-metal dielectric (IMD) CMOS technologies. SAM formed on hydrogen silesquioxane (HSQ), which is a low-k dielectric, has been demonstrated to be effective in preventing diffusion of copper ions into the porous dielectric. This has been shown by fabricating...
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