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In this paper, a novel method is introduced to fabricate nanoscale silicon oxide islands array. Rectangle islands patterns with edge length less than 100 nm are fabricated by traditional contact lithography and buffered oxide etching process. Precise sacrificial layer etching technique is used to control the size of islands from micro-scale to nanoscale accurately. This fabrication method is CMOS...
A nerve block training phantom is being developed for use with ultrasound systems in low-resource environments. Two design options are being pursued: make-as-needed and temporally stable. The make-as-needed design is intended for production within the low-resource environment using locally available materials. The temporally stable design will be produced in the United States and transported to the...
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