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Iron films with different thickness were prepared on glass substrate by DC magnetron sputtering. Arrays of α-Fe2O3 nanowires and nanosheets were grown on iron films by thermal oxidation. The morphology and structure of the prepared α-Fe2O3 nanostructures were characterized by SEM, XRD, XPS, Raman and HRTEM. Field emission properties including I-V characteristics, emission uniformity and stability...
Summary form only given. Titanium nitride films are extensively used in numerous industrial areas owing to their superior mechanical properties such as high abrasion resistance, low friction coefficient, high temperature stability and high hardness. The mechanical properties of TiN film are strongly related to its preferred orientation. This work reports the deposition of poly crystalline and hard...
Nanostructured copper(II) oxide film was deposited using reactive DC magnetron sputtering. It has been characterized using XRD, EDAX, XPS, and FESEM. The grain size of copper oxide film was found to be 40-65 nm with size distribution. The entire study was divided into two parts. In the first part, the film has been studied for its response to alcohol at different temperatures to find the optimum sensing...
ZnO-based thin-film transistors (TFT) have been fabricated on p-Si (100) substrates by radio frequency (rf) magnetron sputtering at room temperature with a bottom gate configuration. The XRD and SEM show that ZnO films had high crystalline quality. The ZnO films present an average optical transmission (including the glass substrate) of 80% in the visible part of the spectrum. The electrical properties...
This study reports on carbon and tungsten deposition on a heated silicon substrate under He+ bombardment in a magnetron sputtering device. The discharge was operated at constant pressure of 1.33 Pa for two discharge current intensities (200 mA and 600 mA) and target power density up to 40 Wcm-2. The deposited films were characterized by scanning electron microscopy (SEM), atomic force microscopy (AFM)...
This paper reports the photoelectric property and surface morphology of amorphous titanium dioxide (TiO2) made at the different substrate temperatures by RF- sputtering on the glass. Five different temperatures (room temperature, 100degC, 200degC, 300degC and 400degC) are set on the substrate holder. The thicknesses of the film are 100 nm, 300 nm and 500 nm. After preparing amorphous TiO2 thin film,...
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