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ZnO thin films were deposited using thermal chemical vapor deposition (TCVD) using gold as the catalyst in a two furnaces system. Carbothermal technique is employed in this work where graphite was mixed into ZnO powder with 1:1 ratio as the precursor. Different thicknesses of gold were deposited on the substrate to study its effect to the properties of the thin films. The ZnO nanostructures were then...
This paper reports on the effect of annealing temperature on the photoluminescence (PL) properties of ZnO thin film. Sol-gel spin coating method was used to prepare the ZnO templates on silicon substrate. ZnO thin films were then deposited by thermal chemical vapor deposition technique by using Zinc Acetate dihydrate as a precursor. Deposited films are annealed at various temperatures; from 650°C...
Thin film ZnO/Si heterojunction solar cells were explored for their potentially low cost application. Microcrystalline silicon (??c-Si) deposited by metal induced growth (MIG) demonstrated viable photo response as a thin film base layer. Modeling using AMPS-1D was performed on various heterostructures. In thin film devices, Interface defects of 8.8??1011 1/cm2-eV were shown to significantly reduce...
ZnO acicular nanostructure was designed and grown from aqueous solution on the conductive substrate. The diameter of ZnO was 50 nm and length was about 5 mum. due to the large aspect ratio, the as-prepare ZnO sample was applied in filed emission with turn-on electric intensity of 3.2 V/mum and enhancement factor beta of 2830.
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