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In this paper, ZnO thin films were deposited on SiO2/Si (100) substrates by radio frequency magnetron sputtering using high purity (99.999%) ZnO target, grown time was 2 h, 4 h and 8 h respectively. After annealing in pure oxygen atmosphere, high-quality ZnO thin film was obtained. X-ray diffraction (XRD) and energy dispersive spectroscopy (EDS) were employed to characterize the quality of the films...
We have fabricated and characterized the field effect transistors having epitaxial-graphene channel grown on Si substrates. Epitaxial graphene is usually formed on SiC substrates by ultrahigh-vacuum (UHV) annealing. We used an approach to grow 3C-SiC(111) on Si substrates and subsequently to anneal it in UHV to make few layers of graphene on the sample surface. Backgate transistors using the SiC layer...
The interaction distance between Si nanoluster and Er is investigated using multilayers. We find that the effective sensitization distance can be more than twice the cluster-Er interaction distance due to Er-Er energy transfer.
SiC nanocrystals growth through the surface reaction between spin-on C60 dissolved in Carbon Disulphide (CS2) and Si substrate and 800degC (100 rains.) annealed has been investigated. Scanning Electron and Atomic Force Microscopy showed the crests of C60 clusters formed preferentially on the Si substrate steps with 40-60 nm cluster sizes. Silicon carbide nanocrystallite formation after anneal. has...
We propose a novel method to fabricate quantum dot (QD) arrays, utilizing nanometer-sized columnar structures of obliquely deposited thin films arising from the self-shadowing effect. We found that columns consisting of alternating arrays of QDs and barriers can be formed by means of alternate oblique depositions of the semiconductor and the dielectric onto rotating substrates. The deposition conditions...
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