The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
A major hurdle in VLSI/ULSI technology has been the inability to grow ultrathin oxides with low defect and interface trap densities and to generate a planar stress-free silicon/silicon-dioxide (Si/SiO/sub 2/) interface. The authors describe the fabrication of thin multilayered stacked SiO/sub 2/ structure with such qualities. A huge improvement in the quality of these stacked oxides has been achieved...
A novel transistor with compact structure has been developed for MOS devices. This transistor, whose gate electrode surrounds the pillar silicon island, reduces the occupied area for all kinds of circuits. For example, the occupied area of a CMOS inverter can be shrunk to 50% of that using planar transistors. The other advantages are steep cutoff characteristics, very small substrate bias effects,...
A shallow trench isolation (STI) technology, RIE (reactive ion etching), CVD (chemical vapor deposition) oxide fill, and polarization are used to realize lithography-limited, submicron device and isolation dimensions. A novel boron diffusion technique is used for nMOSFET field doping, so that the parasitic sidewall inversion (leakage) problem is eliminated. It is shown that both the channel width...
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.